Applied Materials, Inc. announced a next-generation etch tool, the Applied Centris Sym3 Etch system, featuring an entirely new chamber for atomic-level precision manufacturing. To overcome within-chip feature variations, the Centris Sym3 system provides chipmakers with the control and precision needed to pattern and create densely packed 3D structures in advanced memory and logic chips.   “The Sym3 system represents a brand new design, built from the ground up, that solves persistent and impen...